Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layers.
Identifieur interne : 000B23 ( Main/Exploration ); précédent : 000B22; suivant : 000B24Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layers.
Auteurs : RBID : pubmed:22414989Abstract
Nanotubular titanium dioxide thin films were prepared by anodization of titanium metal films evaporated on indium tin oxide (ITO) coated glass. A facile method to enhance the adhesion of the titanium film to the ITO glass was developed. An optimum thickness of 550 nm for the evaporated titanium was found to keep the film adhered to ITO during the anodization. The films were further modified by growing amorphous titania, alumina and tantala thin films conformally in the nanotubes by atomic layer deposition (ALD). The optical, electrical and physical properties of the different structures were compared. It was shown that even 5 nm thin layers can modify the properties of the nanotubular titanium dioxide films.
DOI: 10.1088/0957-4484/23/12/125707
PubMed: 22414989
Links toward previous steps (curation, corpus...)
Le document en format XML
<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en">Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layers.</title><author><name sortKey="Tupala, Jere" uniqKey="Tupala J">Jere Tupala</name><affiliation wicri:level="1"><nlm:affiliation>Department of Chemistry, FI-00014 University of Helsinki, PO Box 55, Finland. jere.tupala@helsinki.fi</nlm:affiliation><country xml:lang="fr">Finlande</country><wicri:regionArea>Department of Chemistry, FI-00014 University of Helsinki, PO Box 55</wicri:regionArea></affiliation></author><author><name sortKey="Kemell, Marianna" uniqKey="Kemell M">Marianna Kemell</name></author><author><name sortKey="H Rk Nen, Emma" uniqKey="H Rk Nen E">Emma Härkönen</name></author><author><name sortKey="Ritala, Mikko" uniqKey="Ritala M">Mikko Ritala</name></author><author><name sortKey="Leskel, Markku" uniqKey="Leskel M">Markku Leskelä</name></author></titleStmt><publicationStmt><date when="2012">2012</date><idno type="doi">10.1088/0957-4484/23/12/125707</idno><idno type="RBID">pubmed:22414989</idno><idno type="pmid">22414989</idno><idno type="wicri:Area/Main/Corpus">000E29</idno><idno type="wicri:Area/Main/Curation">000E29</idno><idno type="wicri:Area/Main/Exploration">000B23</idno></publicationStmt></fileDesc><profileDesc><textClass></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">Nanotubular titanium dioxide thin films were prepared by anodization of titanium metal films evaporated on indium tin oxide (ITO) coated glass. A facile method to enhance the adhesion of the titanium film to the ITO glass was developed. An optimum thickness of 550 nm for the evaporated titanium was found to keep the film adhered to ITO during the anodization. The films were further modified by growing amorphous titania, alumina and tantala thin films conformally in the nanotubes by atomic layer deposition (ALD). The optical, electrical and physical properties of the different structures were compared. It was shown that even 5 nm thin layers can modify the properties of the nanotubular titanium dioxide films.</div></front></TEI><pubmed><MedlineCitation Owner="NLM" Status="PubMed-not-MEDLINE"><PMID Version="1">22414989</PMID><DateCreated><Year>2012</Year><Month>04</Month><Day>18</Day></DateCreated><DateCompleted><Year>2012</Year><Month>07</Month><Day>12</Day></DateCompleted><Article PubModel="Print"><Journal><ISSN IssnType="Electronic">1361-6528</ISSN><JournalIssue CitedMedium="Internet"><Volume>23</Volume><Issue>12</Issue><PubDate><Year>2012</Year><Month>Mar</Month><Day>30</Day></PubDate></JournalIssue><Title>Nanotechnology</Title><ISOAbbreviation>Nanotechnology</ISOAbbreviation></Journal><ArticleTitle>Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layers.</ArticleTitle><Pagination><MedlinePgn>125707</MedlinePgn></Pagination><ELocationID EIdType="doi" ValidYN="Y">10.1088/0957-4484/23/12/125707</ELocationID><Abstract><AbstractText>Nanotubular titanium dioxide thin films were prepared by anodization of titanium metal films evaporated on indium tin oxide (ITO) coated glass. A facile method to enhance the adhesion of the titanium film to the ITO glass was developed. An optimum thickness of 550 nm for the evaporated titanium was found to keep the film adhered to ITO during the anodization. The films were further modified by growing amorphous titania, alumina and tantala thin films conformally in the nanotubes by atomic layer deposition (ALD). The optical, electrical and physical properties of the different structures were compared. It was shown that even 5 nm thin layers can modify the properties of the nanotubular titanium dioxide films.</AbstractText></Abstract><AuthorList CompleteYN="Y"><Author ValidYN="Y"><LastName>Tupala</LastName><ForeName>Jere</ForeName><Initials>J</Initials><Affiliation>Department of Chemistry, FI-00014 University of Helsinki, PO Box 55, Finland. jere.tupala@helsinki.fi</Affiliation></Author><Author ValidYN="Y"><LastName>Kemell</LastName><ForeName>Marianna</ForeName><Initials>M</Initials></Author><Author ValidYN="Y"><LastName>Härkönen</LastName><ForeName>Emma</ForeName><Initials>E</Initials></Author><Author ValidYN="Y"><LastName>Ritala</LastName><ForeName>Mikko</ForeName><Initials>M</Initials></Author><Author ValidYN="Y"><LastName>Leskelä</LastName><ForeName>Markku</ForeName><Initials>M</Initials></Author></AuthorList><Language>eng</Language><PublicationTypeList><PublicationType>Journal Article</PublicationType><PublicationType>Research Support, Non-U.S. Gov't</PublicationType></PublicationTypeList></Article><MedlineJournalInfo><Country>England</Country><MedlineTA>Nanotechnology</MedlineTA><NlmUniqueID>101241272</NlmUniqueID><ISSNLinking>0957-4484</ISSNLinking></MedlineJournalInfo></MedlineCitation><PubmedData><History><PubMedPubDate PubStatus="entrez"><Year>2012</Year><Month>3</Month><Day>15</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="pubmed"><Year>2012</Year><Month>3</Month><Day>15</Day><Hour>6</Hour><Minute>0</Minute></PubMedPubDate><PubMedPubDate PubStatus="medline"><Year>2012</Year><Month>3</Month><Day>15</Day><Hour>6</Hour><Minute>1</Minute></PubMedPubDate></History><PublicationStatus>ppublish</PublicationStatus><ArticleIdList><ArticleId IdType="doi">10.1088/0957-4484/23/12/125707</ArticleId><ArticleId IdType="pubmed">22414989</ArticleId></ArticleIdList></PubmedData></pubmed></record>Pour manipuler ce document sous Unix (Dilib)
EXPLOR_STEP=IndiumV2/Data/Main/Exploration
HfdSelect -h $EXPLOR_STEP/biblio.hfd -nk 000B23 | SxmlIndent | more
Ou
HfdSelect -h $EXPLOR_AREA/Data/Main/Exploration/biblio.hfd -nk 000B23 | SxmlIndent | more
Pour mettre un lien sur cette page dans le réseau Wicri
{{Explor lien
|wiki= *** parameter Area/wikiCode missing ***
|area= IndiumV2
|flux= Main
|étape= Exploration
|type= RBID
|clé= pubmed:22414989
|texte= Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layers.
}}
Pour générer des pages wiki
HfdIndexSelect -h $EXPLOR_AREA/Data/Main/Exploration/RBID.i -Sk "pubmed:22414989" \
| HfdSelect -Kh $EXPLOR_AREA/Data/Main/Exploration/biblio.hfd \
| NlmPubMed2Wicri -a IndiumV2
| This area was generated with Dilib version V0.5.76. |  |